The present invention is directed to a method and device to desorb an analyte using heat to allow desorption of the analyte molecules, where the desorbed analyte molecules are ionized with ambient.
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The generation of EUV light includes rotating a cylinder at least partially coated with a plasma-forming target material, directing pulsed illumination to a first set of helically-arranged spots.Īpparatus and method for thermal assisted desorption ionization systems Systems and methods for protecting an EUV light source chamber from high pressure source material leaksĪ device is described herein which may comprise a chamber, a fluid line, a pressurized source material in the fluid line, a component restricting flow of the source material into the chamber, a.Ĭontinuous generation of extreme ultraviolet light
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In an X-ray generation method for irradiating an ultraviolet laser beam emitted from an ultraviolet.
ANPOD UVC STERILIZER GENERATOR
In an X-ray generator using an ultraviolet laser, the generation of the X-ray is stabilized. Radiating systems for affecting insect behaviorĪn insect decoy is provided that includes a vapor-isolated vessel, a chemical compound disposed within the vapor-isolated vessel, and an excitation energy source. Target supply device and extreme ultraviolet light generation apparatusĪ target supply device may include a receptacle for holding a liquid target material, a first electrode disposed within the receptacle, a nozzle portion provided in the receptacle, a second. LPP EUV light source and method for producing the sameĪn LPP EUV light source includes a vacuum chamber 12 that is maintained in a vacuum environment a gas jet device 14 that forms a hypersonic steady gas jet 1 of the target substance inside the. Systems and methods for optics cleaning in an EUV light sourceĪn extreme-ultraviolet (EUV) light source is described herein comprising an optic a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic and a. Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation systemĪn ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or.Įnergy degrader and charged particle irradiation system including the sameĪn energy degrader includes: a damping unit that attenuates energy of incident charged particles and has a thickness changing stepwise or continuously according to a position of a two-dimensional. A portion of the.Īrrangement for the handling of a liquid metal for cooling revolving components of a radiation source based on a radiation-emitting plasmaĪn arrangement for handling a liquid metal for cooling revolving components of a radiation source based on a radiation-emitting plasma has the handling arrangement for the liquid metal comprises a. System and method for emitting infrared radiation using reflected radiation to enhance emission efficiencyĪ source assembly (48) configured to generate infrared electromagnetic radiation includes an emitter (60) that emits electromagnetic radiation over an emission solid angle. The present invention is directed to a mobile radiation system that comprises a mobile radiation device coupled to a control unit a radiation blocker having an adaptor opening for receiving said. Mobile UVA curing system for collision and cosmetic repair of automobiles
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Chamber and extreme ultraviolet light generation apparatusĪ chamber used in an extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target material with a laser beam may include a chamber receptacle, a.